The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 06, 2018

Filed:

Nov. 08, 2016
Applicant:

Taiwan Semiconductor Manufacturing Co., Ltd., Hsinchu, TW;

Inventors:

Meng-Han Lin, Hsinchu, TW;

Chieh-Chih Chou, New Taipei, TW;

Chih-Wen Hsiung, Hsinchu, TW;

Kong-Beng Thei, Pao-Shan Village, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/872 (2006.01); H01L 21/225 (2006.01); H01L 21/265 (2006.01); H01L 21/285 (2006.01); H01L 21/762 (2006.01); H01L 29/06 (2006.01); H01L 29/66 (2006.01); H01L 21/3115 (2006.01);
U.S. Cl.
CPC ...
H01L 29/872 (2013.01); H01L 21/2253 (2013.01); H01L 21/2255 (2013.01); H01L 21/26513 (2013.01); H01L 21/28518 (2013.01); H01L 21/762 (2013.01); H01L 21/76202 (2013.01); H01L 29/0619 (2013.01); H01L 29/0623 (2013.01); H01L 29/0649 (2013.01); H01L 29/66143 (2013.01); H01L 21/3115 (2013.01);
Abstract

A Schottky barrier diode is provided, which includes a semiconductor substrate, a first well region, an isolation region, a silicide layer and a silicon oxide-containing layer. The first well region of a first conductivity type is in the semiconductor substrate. The isolation region is in the first well region. The silicide layer is laterally adjacent to the isolation region, and over and in contact with the first well region. The silicon oxide-containing layer is over and in contact with the isolation region.


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