The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 30, 2018

Filed:

Mar. 10, 2014
Applicant:

Maxim Integrated Products, Inc., San Jose, CA (US);

Inventors:

Nicole D. Kerness, Menlo Park, CA (US);

Christopher F. Edwards, Sunnyvale, CA (US);

Khanh Tran, Milpitas, CA (US);

Joy T. Jones, Fremont, CA (US);

Pirooz Parvarandeh, Los Altos Hills, CA (US);

Assignee:

Maxim Integrated Products, Inc., San Jose, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 31/0352 (2006.01); H01L 31/0232 (2014.01); H01L 31/103 (2006.01);
U.S. Cl.
CPC ...
H01L 31/03529 (2013.01); H01L 31/02327 (2013.01); H01L 31/035281 (2013.01); H01L 31/103 (2013.01); Y02E 10/50 (2013.01);
Abstract

Light sensors are described that include a trench structure integrated therein. In an implementation, the light sensor includes a substrate having a dopant material of a first conductivity type and multiple trenches disposed therein. The light sensor also includes a diffusion region formed proximate to the multiple trenches. The diffusion region includes a dopant material of a second conductivity type. A depletion region is created at the interface of the dopant material of the first conductivity type and the dopant material of the second conductivity type. The depletion region is configured to attract charge carriers to the depletion region, at least substantially a majority of the charge carriers generated due to light incident upon the substrate.


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