The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 30, 2018

Filed:

Oct. 07, 2014
Applicant:

Hitachi High-technologies Corporation, Minato-ku, Tokyo, JP;

Inventors:

Kenji Aoki, Tokyo, JP;

Tsutomu Saitou, Tokyo, JP;

Kotaro Hosoya, Tokyo, JP;

Mitsuhiro Nakamura, Tokyo, JP;

Kunji Shigeto, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/28 (2006.01); H01J 37/29 (2006.01); H01J 37/073 (2006.01); H01J 37/244 (2006.01);
U.S. Cl.
CPC ...
H01J 37/292 (2013.01); H01J 37/073 (2013.01); H01J 37/244 (2013.01); H01J 37/28 (2013.01); H01J 2237/18 (2013.01); H01J 2237/24465 (2013.01); H01J 2237/24475 (2013.01); H01J 2237/2809 (2013.01);
Abstract

The objective of the present invention is to provide a charged particle beam device, wherein the positional relationship between reflected electron detection elements and a sample and the vacuum state of the sample surroundings are evaluated to select automatically a reflected electron detection element appropriate for acquiring an intended image. In this charged particle beam device, all the reflected electron detection elements are selected when the degree of vacuum inside the sample chamber is high and the sample is distant from the reflected electron detectors, while a reflected electron detection element appropriate for acquiring a compositional image or a height map image is selected when the degree of vacuum inside the sample chamber is high and the sample is close to the reflected electron detectors. When the degree of vacuum inside the sample chamber is low, all the reflected electron detection elements are selected.


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