The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 30, 2018

Filed:

Apr. 20, 2016
Applicant:

Applied Materials Israel Ltd., Rehovot, IL;

Inventor:

Pavel Margulis, Ashdod, IL;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/147 (2006.01); H01J 37/28 (2006.01); H01J 37/06 (2006.01);
U.S. Cl.
CPC ...
H01J 37/1474 (2013.01); H01J 37/06 (2013.01); H01J 37/28 (2013.01); H01J 2237/063 (2013.01);
Abstract

A method for scanning an object with a charged particle beam, the method may include repeating, for each pair of scan lines out of multiple pairs of scan lines, the stages of: (i) deflecting the charged particle beam along a first direction, thereby scanning the object along a first scan line of the pair of scan lines; (ii) collecting electrons emitted from the object during the scanning of the object along a majority of the first scan line; (iii) deflecting the charged particle beam along a second direction that is normal to the first direction; (iv) deflecting the charged particle beam along a third direction that is opposite to the first direction, thereby scanning the object along a second scan line of the pair of scan lines; (v) collecting electrons emitted from the object during the scanning of the object along a majority of the second scan line; and (vi) deflecting the charged particle beam along the second direction that is normal to the third direction.


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