The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 30, 2018
Filed:
Aug. 26, 2016
Toshiba Memory Corporation, Tokyo, JP;
Daisuke Kawamura, Kiyosu Aichi, JP;
Koji Matsuo, Ama Aichi, JP;
Masanobu Baba, Yokkaichi Mie, JP;
Tatsuro Shinozaki, Yokkaichi Mie, JP;
Taishi Ishikura, Kuwana Mie, JP;
TOSHIBA MEMORY CORPORATION, Tokyo, JP;
Abstract
According to one embodiment, an imprint pattern forming method includes providing a substrate with a pattern formation region and a peripheral region, the peripheral region having a surface lower than a surface of the pattern formation region, located at a periphery of the pattern formation region. The method includes forming an auxiliary pattern with a predetermined height on at least a portion of the peripheral region, providing a resist layer on at least the pattern formation region, and imprinting the resist layer using a template by locating the template in a region which includes a portion of the pattern formation region and a portion of the peripheral region.