The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 23, 2018

Filed:

May. 23, 2014
Applicant:

Amkor Technology, Inc., Chandler, AZ (US);

Inventors:

Glenn Rinne, Apex, NC (US);

Dean Zehnder, Hillsborough, NC (US);

Christopher J. Berry, Chandler, AZ (US);

Robert Lanzone, Chandler, AZ (US);

Ludovico Bancod, Chandler, AZ (US);

Assignee:

AMKOR TECHNOLOGY, INC., Tempe, AZ (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 23/00 (2006.01); H01L 23/498 (2006.01); H01L 21/48 (2006.01);
U.S. Cl.
CPC ...
H01L 24/13 (2013.01); H01L 21/4846 (2013.01); H01L 23/49811 (2013.01); H01L 24/11 (2013.01); H01L 24/16 (2013.01); H01L 23/49894 (2013.01); H01L 24/81 (2013.01); H01L 2224/05567 (2013.01); H01L 2224/10145 (2013.01); H01L 2224/10175 (2013.01); H01L 2224/119 (2013.01); H01L 2224/1146 (2013.01); H01L 2224/1147 (2013.01); H01L 2224/1182 (2013.01); H01L 2224/11474 (2013.01); H01L 2224/11831 (2013.01); H01L 2224/11849 (2013.01); H01L 2224/11903 (2013.01); H01L 2224/131 (2013.01); H01L 2224/13017 (2013.01); H01L 2224/13021 (2013.01); H01L 2224/1357 (2013.01); H01L 2224/1369 (2013.01); H01L 2224/13082 (2013.01); H01L 2224/13083 (2013.01); H01L 2224/13147 (2013.01); H01L 2224/13155 (2013.01); H01L 2224/13565 (2013.01); H01L 2224/16225 (2013.01); H01L 2224/293 (2013.01); H01L 2224/2929 (2013.01); H01L 2224/32238 (2013.01); H01L 2224/73204 (2013.01); H01L 2224/81191 (2013.01); H01L 2224/81203 (2013.01); H01L 2224/83192 (2013.01); H01L 2924/15311 (2013.01); H01L 2924/3651 (2013.01);
Abstract

Methods for copper pillar protection may include forming a metal post over a contact on a semiconductor die, where the metal post comprises a sidewall. A metal cap may be formed on the metal post and may be wider than the width of the metal post. A solder bump may be formed on the metal cap, and a conformal passivation layer may be formed on at least the sidewall of the metal post. The metal cap may be rounded shaped or rectangular shaped in cross-section. The metal post and the metal cap may comprise copper. The metal cap may comprise a copper layer and a nickel layer. The seed metal layer may comprise one or more of titanium, tungsten, and copper. The conformal passivation layer may comprise a nonwettable polymer. Horizontal portions of the conformal passivation layer may be removed utilizing an anisotropic etch such as a plasma etch.


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