The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 16, 2018
Filed:
Nov. 02, 2016
Applicant:
Samsung Electronics Co., Ltd., Suwon-si, Gyeonggi-do, KR;
Inventors:
Jorge A. Kittl, Round Rock, TX (US);
Joon Goo Hong, Austin, TX (US);
Dharmendar Reddy Palle, Austin, TX (US);
Mark S. Rodder, Dallas, TX (US);
Assignee:
Samsung Electronics Co., Ltd., Suwon-si, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/00 (2006.01); H01L 29/78 (2006.01); H01L 29/66 (2006.01); H01L 29/786 (2006.01);
U.S. Cl.
CPC ...
H01L 29/7848 (2013.01); H01L 29/66795 (2013.01); H01L 29/7851 (2013.01); H01L 29/7869 (2013.01);
Abstract
A method for fabricating a fin field effect transistor (finFET) device with a strained channel. During fabrication, after the fin is formed, a sacrificial epitaxial gate stressor is deposited on the fin, causing strain in the fin. SD structures are then formed to anchor the ends of the fin, and the sacrificial epitaxial gate stressor is removed.