Vapor phase growth apparatus and vapor phase growth method

Abstract

A vapor phase growth apparatus includes: a reaction chamber; a lower region provided below the reaction chamber; a rotating body provided in the reaction chamber; a rotating shaft connected to the rotating body and having a lower end provided in the lower region; a support portion provided in an upper portion of the rotating body and supporting a substrate; a reaction gas supply port provided on the reaction chamber and supplying a reaction gas for forming a film on the substrate into the reaction chamber; a rotating mechanism including a rotor, the rotating mechanism provided in the lower region and configured to rotate the rotating shaft; a first bearing provided in the lower region and rotatably supporting the rotating shaft; a second bearing provided below the first bearing in the lower region, the second bearing rotatably supporting the rotating shaft; a first air supply port provided above the rotating mechanism and the first bearing in the lower region, the first air supply port supplying a first gas into the lower region; a second air supply port provided below the rotating mechanism and the second bearing in the lower region, the second air supply port supplying a second gas into the lower region; a first exhaust port provided between the first air supply port and the second air supply port in the lower region, the first exhaust port exhausting the first gas and the second gas from the lower region; and a second exhaust port provided in the reaction chamber and exhausting a surplus reaction gas and a reaction by-product generated by the formation of the film from the reaction chamber.