The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 09, 2018
Filed:
Apr. 17, 2017
Varian Semiconductor Equipment Associates, Inc., Gloucester, MA (US);
Jay Wallace, Danvers, MA (US);
Ernest E. Allen, Rockport, MA (US);
Richard J. Hertel, Boxford, MA (US);
Alexander C. Kontos, Beverly, MA (US);
Shurong Liang, Lynnfield, MA (US);
Jeffrey E. Krampert, Topsfield, MA (US);
Tyler Rockwell, Wakefield, MA (US);
Varian Semiconductor Equipment Associats, Inc., Gloucester, MA (US);
Abstract
A gas injection system, including an extraction plate having an extraction aperture for allowing passage of an ion beam through the extraction plate, the extraction plate further having a gas slot for expulsion of a residue removal gas from the extraction plate. The gas injection system may include a gas conduit extending through the extraction plate between the gas slot and a gas manifold, a gas source connected in fluid communication with the gas manifold, the gas source containing the residue removal gas. The gas manifold may include a valve adjustable between a first position, wherein the residue removal gas is allowed to flow into the extraction plate, and a second portion, wherein the residue removal gas can be vented from the extraction plate. The gas injection system may further include a manifold cover coupled to the gas manifold.