The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 09, 2018

Filed:

Dec. 07, 2015
Applicant:

Nissin Ion Equipment Co., Ltd., Minami-Ku, Kyoto, JP;

Inventors:

Thomas N. Horsky, Boxborough, MA (US);

Sami K. Hahto, Nashua, NH (US);

Assignee:

Nissin Ion Equipment Co., Ltd., Minami-Ku, Kyoto, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01J 27/02 (2006.01); H01J 27/20 (2006.01); C23C 14/48 (2006.01); H01J 37/00 (2006.01);
U.S. Cl.
CPC ...
H01J 27/205 (2013.01); C23C 14/48 (2013.01); H01J 27/022 (2013.01); H01J 37/00 (2013.01);
Abstract

A plasma generator for an ion implanter is provided. The plasma generator includes an ionization chamber for forming a plasma that is adapted to generate a plurality of ions and a plurality of electrons. An interior surface of the ionization chamber is exposed to the plasma and constructed from a first non-metallic material. The plasma generator also includes a thermionic emitter including at least one surface exposed to the plasma. The thermionic emitter is constructed from a second non-metallic material. The plasma generator further includes an exit aperture for extracting at least one of the plurality of ions or the plurality of electrons from the ionization chamber to form at least one of an ion beam or an electron flux. The ion beam or the electron flux comprises substantially no metal. The first and second non-metallic materials can be the same or different from each other.


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