The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 09, 2018
Filed:
Jun. 14, 2011
Catharinus DE Schiffart, Nijmegen, NL;
Michael Jozef Mathijs Renkens, Sittard, NL;
Gerard Van Schothorst, Waardenburg, NL;
Andre Bernardus Jeunink, Bergeijk, NL;
Gregor Edward Van Baars, Eindhoven, NL;
Sander Frederik Wuister, Eindhoven, NL;
Yvonne Wendela Kruijt-stegeman, Eindhoven, NL;
Norbert Erwin Therenzo Jansen, Eindhoven, NL;
Toon Hardeman, 's-Hertogenbosch, NL;
George Arie Jan DE Fockert, Apeldoorn, NL;
Johan Frederik Dijksman, Weert, NL;
Catharinus De Schiffart, Nijmegen, NL;
Michael Jozef Mathijs Renkens, Sittard, NL;
Gerard Van Schothorst, Waardenburg, NL;
Andre Bernardus Jeunink, Bergeijk, NL;
Gregor Edward Van Baars, Eindhoven, NL;
Sander Frederik Wuister, Eindhoven, NL;
Yvonne Wendela Kruijt-Stegeman, Eindhoven, NL;
Norbert Erwin Therenzo Jansen, Eindhoven, NL;
Toon Hardeman, 's-Hertogenbosch, NL;
George Arie Jan De Fockert, Apeldoorn, NL;
Johan Frederik Dijksman, Weert, NL;
ASML NETHERLANDS B.V., Veldhoven, NL;
Abstract
An imprint lithography apparatus having a first frame to be mounted on a floor, a second frame mounted on the first frame via a kinematic coupling, an alignment sensor mounted on the second frame, to align an imprint lithography template arrangement with a target portion of a substrate, and a position sensor to measure a position of the imprint lithography template arrangement and/or a substrate stage relative to the second frame.