The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 02, 2018

Filed:

Jan. 26, 2016
Applicant:

United Microelectronics Corp., Hsin-Chu, TW;

Inventors:

Ching-Wei Lee, Taoyuan, TW;

Li-Cih Wang, Taoyuan, TW;

Tien-Hao Tang, Hsinchu, TW;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 27/02 (2006.01); H01L 29/74 (2006.01); H01L 29/06 (2006.01);
U.S. Cl.
CPC ...
H01L 27/0262 (2013.01); H01L 29/0619 (2013.01); H01L 29/7436 (2013.01);
Abstract

An ESD protection semiconductor device includes a substrate, a buried layer buried in the substrate, a first well formed in the substrate, a first doped region formed in the first well, a second doped region formed in the first well and adjacent to the first doped region, a second well formed in the first well, and a third doped region formed in the second well. The buried layer, the first well, the first doped region, and the third doped region include a first conductivity type while the second doped region and the second well include a second conductivity type complementary to the first conductivity type. The second well is spaced apart from the first doped region and the second doped region by the first well.


Find Patent Forward Citations

Loading…