The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 02, 2018
Filed:
Sep. 25, 2017
Beijing Information Science and Technology University, Beijing, CN;
Mingli Dong, Beijing, CN;
Peng Sun, Beijing, CN;
Wei Li, Beijing, CN;
Jun Wang, Beijing, CN;
Bixi Yan, Beijing, CN;
Naiguang Lv, Beijing, CN;
BEIJING INFORMATION SCIENCE AND TECHNOLOGY UNIVERSITY, Beijing, CN;
Abstract
The present invention provides a method for implementing high-precision orientation and evaluating orientation precision of a large-scale dynamic photogrammetry system, including steps: a) selecting a scale bar, arranging code points at two ends of the scale bar, and performing length measurement on the scale bar; b) evenly dividing a measurement space into multiple regions, sequentially placing the scale bar in each region, and photographing the scale bar by using left and right cameras; d) limiting self-calibration bundle adjustment by using multiple length constraints, adjustment parameters including principal point, principal distance, radial distortion, eccentric distortion, in-plane distortion, exterior orientation parameter and spatial point coordinate; and e) performing traceable evaluation of orientation precision of the photogrammetry system. The present invention can effectively reduce the relative error in length measurement.