The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 26, 2017

Filed:

Dec. 15, 2016
Applicants:

Taiwan Semiconductor Manufacturing Company Limited, Hsin-Chu, TW;

National Taiwan University, Taipei, TW;

Inventors:

Meng-Yu Lin, New Taipei, TW;

Shih-Yen Lin, Tainan, TW;

Si-Chen Lee, Taipei, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/16 (2006.01); H01L 29/423 (2006.01); H01L 29/66 (2006.01); H01L 29/786 (2006.01);
U.S. Cl.
CPC ...
H01L 29/1606 (2013.01); H01L 29/42356 (2013.01); H01L 29/42384 (2013.01); H01L 29/42392 (2013.01); H01L 29/66015 (2013.01); H01L 29/78603 (2013.01); H01L 29/78684 (2013.01); H01L 2924/13088 (2013.01);
Abstract

A semiconductor device and method of formation are provided. The semiconductor device includes a substrate, a first active area over the substrate, a second active area over the substrate, a graphene channel between the first active area and the second active area, and a first in-plane gate. In some embodiments, the graphene channel, the first in-plane gate, the first active area, and the second active area include graphene. A method of forming the first in-plane gate, the first active area, the second active area, and the graphene channel from a single layer of graphene is also provided.


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