The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 26, 2017
Filed:
Nov. 07, 2013
Hitachi High-technologies Corporation, Tokyo, JP;
Hideki Hasegawa, Tokyo, JP;
Hiroyuki Satake, Tokyo, JP;
Masao Suga, Tokyo, JP;
Yuichiro Hashimoto, Tokyo, JP;
Hitachi High-Technologies Corporation, Tokyo, JP;
Abstract
Provided is an ion source achieving high sensitivity and high robustness while executing a plurality of types of ionization schemes. To this end, a hybrid ion source () includes: a chamber (); a first ion source () to spray a sample solution () for ionization; a second ion source () to ionize droplets and/or a gas component sprayed from the first ion source (); a first electrode () to introduce a first ion () generated by the first ion source (), and a second ion generated by the second ion source (); and an exhaust pump () that generates air flow () in a direction from a first space area () where the first ion () is generated to a second space area () in the second ion source () where the second ion is generated.