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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9851637 B1

PDFFull Text
Date of Patent:
Dec. 26, 2017

Filed:

Oct. 04, 2016

Resist composition, method of forming resist pattern, compound, and acid diffusion control agent

Applicant:

Tokyo Ohka Kogyo Co., Ltd., Kawasaki-shi, JP;

Inventors:

Takashi Nagamine, Kawasaki, JP;

Kotaro Endo, Kawasaki, JP;

Hideto Nito, Kawasaki, JP;

Assignee:

TOKYO OHKA KOGYO CO., LTD., Kawasaki-shi, JP;

Attorney:

Morrison & Foerster LLP

Primary Examiner:

John S Chu

Int. Cl.
CPC ...
G03F 7/004 (2006.01); G03F 7/40 (2006.01); C07C 65/10 (2006.01); C07C 63/08 (2006.01); C07C 65/05 (2006.01); C07C 321/28 (2006.01); G03F 7/039 (2006.01); G03F 7/16 (2006.01); G03F 7/20 (2006.01); G03F 7/32 (2006.01); C07C 381/12 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0045 (2013.01); C07C 63/08 (2013.01); C07C 65/05 (2013.01); C07C 65/10 (2013.01); C07C 321/28 (2013.01); C07C 381/12 (2013.01); G03F 7/0397 (2013.01); G03F 7/162 (2013.01); G03F 7/2006 (2013.01); G03F 7/325 (2013.01); G03F 7/40 (2013.01);
Abstract

A resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution under action of acid, the resist composition including a base component (A) which exhibits changed solubility in a developing solution under action of acid, and a compound (D1) represented by general formula (d1), wherein Zrepresents an anion having an aromatic ring containing a hydroxybenzoic acid skeleton, provided that at least one hydrogen atom of the aromatic ring has been substituted with a halogen atom; m represents an integer of 1 or more; and Mrepresents an organic cation having a valency of m.Z(M)  (d1)

Find Patent Forward Citations

Nagamine, Takashi. (2017). Resist composition, method of forming resist pattern, compound, and acid diffusion control agent (U.S. Patent No. 9851637). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9851637

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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