The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 26, 2017
Filed:
Dec. 30, 2010
Jonghoon Baek, San Jose, CA (US);
Edwin C. Suarez, Fremont, CA (US);
Tsutomu Tanaka, Santa Clara, CA (US);
Edward P. Hammond, Iv, Hillsborough, CA (US);
Jeonghoon OH, San Jose, CA (US);
Jonghoon Baek, San Jose, CA (US);
Edwin C. Suarez, Fremont, CA (US);
Tsutomu Tanaka, Santa Clara, CA (US);
Edward P. Hammond, IV, Hillsborough, CA (US);
Jeonghoon Oh, San Jose, CA (US);
APPLIED MATERIALS, INC., Santa Clara, CA (US);
Abstract
Embodiments of the present invention generally relate to apparatus for reducing arcing and parasitic plasma in substrate processing chambers. The apparatus generally include a processing chamber having a substrate support, a backing plate, and a showerhead disposed therein. A showerhead suspension electrically couples the backing plate to the showerhead. An electrically conductive bracket is coupled to the backing plate and spaced apart from the showerhead. The electrically conductive bracket may include a plate, a lower portion, an upper portion, and a vertical extension. The electrically conductive bracket contacts an electrical isolator.