The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 19, 2017
Filed:
Dec. 17, 2014
Applicant:
Carl Zeiss Smt Gmbh, Oberkochen, DE;
Inventor:
Joachim Hartjes, Aalen, DE;
Assignee:
Carl Zeiss SMT GmbH, Oberkochen, DE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/54 (2006.01); G03B 27/72 (2006.01); G03F 7/20 (2006.01); G01L 21/22 (2006.01); G01B 13/12 (2006.01); G01B 7/14 (2006.01);
U.S. Cl.
CPC ...
G03F 7/7085 (2013.01); G01L 21/22 (2013.01); G03F 7/702 (2013.01); G03F 7/70233 (2013.01); G03F 7/70591 (2013.01); G01B 7/14 (2013.01); G01B 13/12 (2013.01);
Abstract
A lithography apparatus is disclosed, which comprises a mirror having at least two mirror segments which are joined together in such a way that an interspace is formed between the mirror segments, and a sensor for detecting the relative position of the mirror segments, wherein the sensor is arranged in the interspace between the mirror segments.