The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 19, 2017
Filed:
Jun. 29, 2016
Applicant:
Shin-etsu Chemical Co., Ltd., Tokyo, JP;
Inventors:
Jun Hatakeyama, Joetsu, JP;
Teppei Adachi, Joetsu, JP;
Assignee:
SHIN-ETSU CHEMICAL CO., LTD., Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/004 (2006.01); G03F 7/38 (2006.01); C08F 220/22 (2006.01); C08F 220/18 (2006.01); C08F 220/24 (2006.01); C08F 220/28 (2006.01); G03F 7/20 (2006.01); G03F 7/40 (2006.01); C08F 220/30 (2006.01); H01L 21/027 (2006.01); G03F 7/039 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0046 (2013.01); C08F 220/18 (2013.01); C08F 220/22 (2013.01); C08F 220/24 (2013.01); C08F 220/28 (2013.01); C08F 220/30 (2013.01); G03F 7/0048 (2013.01); G03F 7/0397 (2013.01); G03F 7/2037 (2013.01); G03F 7/2041 (2013.01); G03F 7/38 (2013.01); G03F 7/40 (2013.01); H01L 21/0274 (2013.01);
Abstract
A resist composition is provided comprising (A) a fluorine-containing polymer, (B) a base resin, (C) an acid generator, and (D) a solvent mixture of a first solvent which is a C-Cketone, C-Calcohol, C-Cether or C-Cester and a second solvent which is a lactone ring-containing C-Ccompound. A pattern is formed by coating the resist composition, prebake, exposure, and development. In immersion lithography, the resist film is improved in water slip. In EB or EUV lithography, outgassing is suppressed and edge roughness is reduced.