The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 19, 2017

Filed:

Apr. 21, 2014
Applicant:

Ebara Corporation, Tokyo, JP;

Inventors:

Yoshio Minami, Tokyo, JP;

Masaaki Kimura, Tokyo, JP;

Assignee:

EBARA CORPORATION, Tokyo, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B08B 3/04 (2006.01); B05C 3/02 (2006.01); B05C 21/00 (2006.01); B05C 3/04 (2006.01); C25D 17/00 (2006.01); C25D 17/06 (2006.01); C25D 21/08 (2006.01);
U.S. Cl.
CPC ...
B05C 3/02 (2013.01); B05C 3/04 (2013.01); B05C 21/00 (2013.01); B08B 3/047 (2013.01); C25D 17/001 (2013.01); C25D 17/004 (2013.01); C25D 17/06 (2013.01); C25D 21/08 (2013.01);
Abstract

A substrate plating apparatus is disclosed. The apparatus includes a substrate holder; a plating bath configured to plate a surface of the substrate in a plating solution; a cleaning bath configured to clean the substrate holder and the substrate with a cleaning liquid; an inner shell disposed in the cleaning bath and configured to house the substrate holder holding the substrate therein; and a cleaning liquid supply conduit configured to supply a cleaning liquid into the inner shell to clean the substrate, together with the substrate holder, with the cleaning liquid. The inner shell has an inner surface having an uneven configuration that follows an uneven exterior configuration of the substrate holder holding the substrate.


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