The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 05, 2017

Filed:

Jan. 16, 2015
Applicant:

Tokyo Electron Limited, Tokyo, JP;

Inventors:

Satoshi Nishimura, Kumamoto, JP;

Naoki Imoto, Kumamoto, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B05B 1/14 (2006.01); H01L 21/67 (2006.01); G03F 7/16 (2006.01);
U.S. Cl.
CPC ...
H01L 21/6708 (2013.01); H01L 21/67051 (2013.01); G03F 7/16 (2013.01);
Abstract

Disclosed is a processing liquid nozzle that supplies a processing liquid to a substrate. The processing liquid nozzle includes: a hollow nozzle body; a processing liquid flow space formed inside the nozzle body; and a processing liquid flow path configured to connect a processing liquid ejection port formed in a lower portion of the nozzle body and the processing liquid flow space with each other. The processing liquid flow path perforates the nozzle body in a vertical direction. The processing liquid flow path includes a foreign matter collecting space which is formed below an upper end of the processing liquid flow path so as to sediment and collect foreign matters in the processing liquid.


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