The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 05, 2017
Filed:
Aug. 25, 2015
Applicant:
Tokyo Electron Limited, Tokyo, JP;
Inventors:
Koshi Muta, Koshi, JP;
Hideharu Kyoda, Koshi, JP;
Assignee:
TOKYO ELECTRON LIMITED, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B05C 11/08 (2006.01); G03F 7/30 (2006.01); H01L 21/67 (2006.01); B05D 1/00 (2006.01); G06F 19/00 (2011.01);
U.S. Cl.
CPC ...
G03F 7/3021 (2013.01); H01L 21/6715 (2013.01); B05C 11/08 (2013.01); B05D 1/005 (2013.01); G06F 19/00 (2013.01);
Abstract
A developing method can perform a developing process on a resist film that is exposed to light. The developing method includes forming a developing solution film by supplying a developing solution onto a surface of a substrate having thereon a resist film that is exposed to light; thinning the developing solution film by pushing out the developing solution containing components dissolved from the resist film; and supplying a new developing solution onto the thinned developing solution film.