The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 28, 2017

Filed:

Apr. 22, 2014
Applicant:

Applied Materials, Inc., Santa Clara, CA (US);

Inventors:

Kin Pong Lo, Fremont, CA (US);

Paul Brillhart, Pleasanton, CA (US);

Balasubramanian Ramachandran, Santa Clara, CA (US);

Satheesh Kuppurao, San Jose, CA (US);

Daniel Redfield, Morgan Hill, CA (US);

Joseph M. Ranish, San Jose, CA (US);

James Francis Mack, Woodside, CA (US);

Kailash Kiran Patalay, Santa Clara, CA (US);

Michael Olsen, Scappoose, OR (US);

Eddie Feigel, Forest Grove, OR (US);

Richard Halpin, Hillsboro, OR (US);

Brett Vetorino, Austin, TX (US);

Assignee:

APPLIED MATERIALS, INC., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 5/08 (2006.01); H05B 3/00 (2006.01); H01L 21/67 (2006.01);
U.S. Cl.
CPC ...
H05B 3/0047 (2013.01); H01L 21/67115 (2013.01);
Abstract

Embodiments of the disclosure generally relate to a reflector for use in a thermal processing chamber. In one embodiment, the thermal processing chamber generally includes an upper dome, a lower dome opposing the upper dome, the upper dome and the lower dome defining an internal volume of the processing chamber, a substrate support disposed within the internal volume, and a reflector positioned above and proximate to the upper dome, wherein the reflector has a heat absorptive coating layer deposited on a side of the reflector facing the substrate support.


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