The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 28, 2017
Filed:
Nov. 11, 2013
Apic Yamada Corporation, Chikuma-shi, Nagano, JP;
Kazuhiko Kobayashi, Chikuma, JP;
Keisuke Suda, Chikuma, JP;
Apic Yamada Corporation, Nagano, JP;
Abstract
Provided is a resist film forming device which uses an electrostatic spray device which is capable of forming a thin film with a uniform thickness on a workpiece. A resist film forming device (), which forms a resist film () on a substrate by electrostatic spraying, comprises: a nozzle () which, upon application of a prescribed voltage, sprays liquid particles which form the raw material for a resist film () toward a substrate () having stepped portions (); a driving means () for causing relative movement of the substrate () or the nozzle (); and a control means () for controlling such that the resist film () is formed on the substrate () having the stepped portions () by the liquid particles.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile