The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 28, 2017
Filed:
Oct. 29, 2014
Tokyo Electron Limited, Tokyo, JP;
Daihen Corporation, Osaka-shi, Osaka, JP;
Hiroo Konno, Miyagi, JP;
Takashi Shimomoto, Osaka, JP;
TOKYO ELECTRON LIMITED, Tokyo, JP;
DAIHEN CORPORATION, Osaka-shi, Osaka, JP;
Abstract
A plasma processing apparatus can control a ratio between an input power during a pulse-on period and an input power during a pulse-off period by a matching operation of a matching device provided on a high frequency transmission line for supplying the high frequency power as a continuous wave without a power modulation. An impedance sensorA provided in a matching device of a plasma generation system includes a RF voltage detector; a voltage-detection-signal generating circuit; an arithmetic-average-value calculating circuit; a weighted-average-value calculating circuit; and a moving-average-value calculating unitof a voltage sensor system, and also includes a RF electric current detector; an electric current-detection-signal generating circuit; an arithmetic-average-value calculating circuit; a weighted-average-value calculating circuit; a moving-average-value calculating unit; and an impedance calculating circuitof an electric current sensor system.