The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 28, 2017
Filed:
Mar. 03, 2014
Applicant:
Entegris, Inc., Billerica, MA (US);
Inventors:
Oleg Byl, Southbury, CT (US);
Joseph D. Sweeney, New Milford, CT (US);
Ying Tang, Brookfield, CT (US);
Richard S. Ray, New Milford, CT (US);
Assignee:
ENTEGRIS, INC., Billerica, MA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/00 (2006.01); H01J 37/317 (2006.01); H01J 37/08 (2006.01); H01L 21/22 (2006.01); C23C 14/48 (2006.01);
U.S. Cl.
CPC ...
H01J 37/3171 (2013.01); C23C 14/48 (2013.01); H01J 37/08 (2013.01); H01L 21/2225 (2013.01); H01J 2237/006 (2013.01); H01J 2237/08 (2013.01);
Abstract
Ion implantation compositions, systems and methods are described, for implantation of dopant species. Specific selenium dopant source compositions are described, as well as the use of co-flow gases to achieve advantages in implant system characteristics such as recipe transition, beam stability, source life, beam uniformity, beam current, and cost of ownership.