The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 28, 2017
Filed:
Apr. 02, 2015
Applicant:
Tokyo Electron Limited, Tokyo, JP;
Inventor:
Koji Mitsuhashi, Yamanashi, JP;
Assignee:
TOKYO ELECTRON LIMITED, Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
C25D 11/24 (2006.01); C25D 21/02 (2006.01); C25D 11/00 (2006.01);
U.S. Cl.
CPC ...
C25D 11/24 (2013.01); C25D 11/005 (2013.01); C25D 11/246 (2013.01); C25D 21/02 (2013.01); Y10T 428/162 (2015.01); Y10T 428/218 (2015.01);
Abstract
A component of a substrate processing apparatus that performs plasma processing on a substrate includes a base mainly formed of an aluminum alloy containing silicon. A film is formed on the surface of the base by an anodic oxidation process which includes connecting the component to an anode of a power supply and immersing the component in a solution mainly formed of an organic acid. The film is impregnated with ethyl silicate.