The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 21, 2017

Filed:

Aug. 12, 2016
Applicant:

Samsung Electronics Co., Ltd., Suwon-si, Gyeonggi-do, KR;

Inventors:

Ho-jin Lee, Seoul, KR;

Byung-lyul Park, Seoul, KR;

Jin-ho An, Seoul, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 23/48 (2006.01); H01L 23/52 (2006.01); H01L 29/40 (2006.01); H01L 23/538 (2006.01); H01L 23/00 (2006.01); H01L 21/768 (2006.01);
U.S. Cl.
CPC ...
H01L 23/5384 (2013.01); H01L 21/76841 (2013.01); H01L 21/76879 (2013.01); H01L 24/13 (2013.01);
Abstract

Integrated circuit (IC) devices are provided including a substrate having a first sidewall defining a first through hole that is a portion of a through-silicon via (TSV) space, an interlayer insulating layer having a second sidewall and a protrusion, wherein the second sidewall defines a second through hole providing another portion of the TSV space and communicating with the first through hole, and the protrusion protrudes toward the inside of the TSV space and defines an undercut region in the first through hole, a TSV structure penetrating the substrate and the interlayer insulating layer and extending through the first through hole and the second through hole, and a via insulating layer surrounding the TSV structure in the first through hole and the second through hole.


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