The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 21, 2017
Filed:
Sep. 30, 2014
Applicant:
Advantest Corporation, Tokyo, JP;
Inventor:
Akio Yamada, Tokyo, JP;
Assignee:
Advantest Corp., Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01J 37/317 (2006.01); H01J 37/20 (2006.01); H01L 21/268 (2006.01); H01J 37/304 (2006.01); G21K 5/10 (2006.01); H01J 37/30 (2006.01);
U.S. Cl.
CPC ...
H01J 37/3174 (2013.01); H01J 37/20 (2013.01); H01J 37/3045 (2013.01); H01L 21/268 (2013.01); G21K 5/10 (2013.01); H01J 37/3007 (2013.01); H01J 2237/0435 (2013.01); H01J 2237/1502 (2013.01); H01J 2237/202 (2013.01); H01J 2237/303 (2013.01);
Abstract
The invention relates to a charged particle beam exposure apparatus configured to expose cut patterns or via patterns on a substrate having a plurality of line patternsarranged on an upper surface of the substrate at a constant pitch by irradiating the substrate with a plurality of charged particle beams Bto Bn while moving a one-dimensional array beam Ain an X direction parallel to the line patterns, the one-dimensional array beam Abeing a beam in which the charged particle beams Bto Bn are arranged in an Y direction orthogonal to the line patterns