The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 14, 2017

Filed:

Oct. 24, 2014
Applicant:

Globalfoundries Singapore Pte. Ltd., Singapore, SG;

Inventors:

Shyue Seng Jason Tan, Singapore, SG;

Yuan Sun, Singapore, SG;

Eng Huat Toh, Singapore, SG;

Ying Keung Leung, Singapore, SG;

Kiok Boone Elgin Quek, Singapore, SG;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 27/115 (2017.01); H01L 29/78 (2006.01); H01L 49/02 (2006.01); H01L 29/788 (2006.01); H01L 29/423 (2006.01); H01L 27/11558 (2017.01); G11C 16/04 (2006.01); H01L 29/94 (2006.01);
U.S. Cl.
CPC ...
H01L 29/7835 (2013.01); G11C 16/0433 (2013.01); H01L 27/11558 (2013.01); H01L 29/42324 (2013.01); H01L 29/7881 (2013.01); H01L 29/7883 (2013.01); H01L 29/7885 (2013.01); H01L 29/94 (2013.01);
Abstract

Non-volatile (NV) Multi-time programmable (MTP) memory cells are presented. The memory cell includes a substrate and first and second wells in the substrate. The memory cell includes first transistor having a select gate, second transistor having a floating gate adjacent to one another and on the second well, and third transistor having a control gate on the first well. The control gate is coupled to the floating gate and the control and floating gates include the same gate layer extending across the first and second wells. The transistors include first and second diffusion regions disposed adjacent to sides of the gates. The first and second diffusion regions include base lightly doped drain (LDD) and halo regions. One of the first and second diffusion regions of one of the second and third transistors includes second LDD and halo regions having higher dopant concentrations than the base LDD and halo regions.


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