The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 14, 2017

Filed:

Oct. 17, 2012
Applicant:

Denso Corporation, Kariya, Aichi-pref., JP;

Inventors:

Shinichi Hoshi, Okazaki, JP;

Shoji Mizuno, Okazaki, JP;

Tetsu Kachi, Nisshin, JP;

Tsutomu Uesugi, Seto, JP;

Kazuyoshi Tomita, Nagoya, JP;

Kenji Ito, Nagoya, JP;

Assignee:

DENSO CORPORATION, Kariya, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 27/06 (2006.01); H01L 29/20 (2006.01); H01L 21/8234 (2006.01); H01L 29/16 (2006.01); H01L 21/388 (2006.01); H01L 29/15 (2006.01); H01H 3/20 (2006.01); H01L 27/07 (2006.01); H01L 29/74 (2006.01); H01L 29/778 (2006.01); H01L 29/66 (2006.01); H01L 21/762 (2006.01); H01L 29/861 (2006.01); H01L 29/06 (2006.01);
U.S. Cl.
CPC ...
H01L 29/7787 (2013.01); H01L 21/76224 (2013.01); H01L 29/66462 (2013.01); H01L 29/7786 (2013.01); H01L 29/0649 (2013.01); H01L 29/2003 (2013.01); H01L 29/861 (2013.01);
Abstract

A semiconductor device includes a HEMT and a diode. The HEMT includes: a substrate having a GaN layer as a channel layer generating a two-dimensional electron gas and an AlGaN layer as a barrier layer on the GaN layer; a source electrode on the AlGaN layer ohmic contacting the AlGaN layer; a drain electrode on the AlGaN layer apart from the source electrode and ohmic contacting the AlGaN layer; an inter-layer insulating film on the AlGaN layer between the source electrode and the drain electrode; and a gate electrode on the inter-layer insulating film. The substrate includes an active layer region generating the two dimensional electron gas in the GaN layer. The diode includes an anode electrically connected to the gate electrode and a cathode electrically connected to the drain electrode.


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