The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 14, 2017
Filed:
Jul. 07, 2014
Applicant:
Fei Company, Hillsboro, OR (US);
Inventors:
Thomas G. Miller, Portland, OR (US);
Shouyin Zhang, Portland, OR (US);
Assignee:
FEI Company, Hillsboro, OR (US);
Primary Examiner:
Int. Cl.
CPC ...
B44C 1/22 (2006.01); C03C 15/00 (2006.01); C03C 25/68 (2006.01); C23F 1/00 (2006.01); H01J 37/32 (2006.01); H01J 37/08 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32651 (2013.01); H01J 37/08 (2013.01); H01J 37/321 (2013.01); H01J 37/32504 (2013.01); H01J 2237/0206 (2013.01); H01J 2237/026 (2013.01); H01J 2237/31749 (2013.01);
Abstract
An inductively coupled plasma source for a focused charged particle beam system includes a conductive shield within the plasma chamber in order to reduce capacitative coupling to the plasma. The internal conductive shield is maintained at substantially the same potential as the plasma source by a biasing electrode or by the plasma. The internal shield allows for a wider variety of cooling methods on the exterior of the plasma chamber.