The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 07, 2017

Filed:

Oct. 20, 2015
Applicant:

Mentor Graphics Corporation, Wilsonville, OR (US);

Inventors:

George P. Lippincott, Lake Oswego, OR (US);

Zhitang Yu, Pleasanton, CA (US);

Xima Zhang, Pleasanton, CA (US);

Assignee:

Mentor Graphics Corporation, Wilsonville, OR (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 17/50 (2006.01); G03F 1/36 (2012.01);
U.S. Cl.
CPC ...
G06F 17/5009 (2013.01); G03F 1/36 (2013.01); G06F 17/5072 (2013.01);
Abstract

Various aspects of the disclosed technology relate to techniques of retargeting layout features. A process window simulation on a layout design is performed to generate process window information that comprises predicted print positions of layout features computed under various process conditions. Retargeted print positions for a plurality of edge fragments in the layout design are then determined based on minimizing a combined change of targeted print positions for the plurality of edge fragments under constraints represented based on the process window information and specification limits for printed layout features. Based on the retargeted print positions, positions of the plurality of edge fragments are adjusted for optical proximity correction.


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