The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 07, 2017
Filed:
Oct. 04, 2012
Applicants:
Frank Johannes Jacobus Van Boxtel, Eindhoven, NL;
Antonius Johannus Van Der Net, Tilburg, NL;
Leonarda Hendrika Van Den Heuvel, Aarle-Rixtel, NL;
Inventors:
Frank Johannes Jacobus Van Boxtel, Eindhoven, NL;
Antonius Johannus Van Der Net, Tilburg, NL;
Leonarda Hendrika Van Den Heuvel, Aarle-Rixtel, NL;
Assignee:
ASML NETHERLANDS B.V., Veldhoven, NL;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/52 (2006.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70875 (2013.01); G03F 7/70891 (2013.01); G03F 7/70991 (2013.01);
Abstract
A lithographic apparatus includes a component and a local cooler to apply a local cooling load to the component. The local cooler has a gas passageway including a flow restriction upstream of the component and configured to direct a flow of gas exiting the flow restriction to cool a surface of the component.