The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 07, 2017
Filed:
Aug. 05, 2016
Fujifilm Corporation, Tokyo, JP;
Ryosuke Ueba, Haibara-gun, JP;
Naoya Iguchi, Haibara-gun, JP;
Tsukasa Yamanaka, Haibara-gun, JP;
Naohiro Tango, Haibara-gun, JP;
Michihiro Shirakawa, Haibara-gun, JP;
Keita Kato, Haibara-gun, JP;
FUJIFILM Corporation, Tokyo, JP;
Abstract
A pattern formation method includes step (i) of forming a first negative type pattern on a substrate by performing step (i-) of forming a first film on the substrate using an actinic ray-sensitive or radiation-sensitive resin composition, step (i-) of exposing the first film and step (i-) of developing the exposed first film in this order; step (iii) of forming a second film at least on the first negative type pattern using an actinic ray-sensitive or radiation-sensitive resin composition (); step (v) of exposing the second film; and step (vi) of developing the exposed second film and forming a second negative type pattern at least on the first negative type pattern.