The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 07, 2017
Filed:
Sep. 05, 2014
Hoyos Vsn Corp., San Juan, PR (US);
Julio Abdala, Southwest Ranches, FL (US);
Patricio Durazo, Tucson, AZ (US);
Gary Peterson, Center City, MN (US);
Claudio Ribeiro, Evanston, IL (US);
William H. Robertson, Jr., Fort Lauderdale, FL (US);
HOYOS INTEGRITY CORPORATION, San Juan, PR (US);
Abstract
A quadric reflector can have an approximately conical shape. The shape can tapers from a wide base to an apex. The apex can include an aperture, a mirror, and a set of one or more optical elements. A mirror can be positioned within an overhang enclosure of the device in a plane approximately parallel to a circular cross section of the conical shape. The mirror can reflect environmental light that is reflected by the quadric reflector into the aperture or reflect light emitting from the aperture onto the quadric reflector. The overhang enclosure can have a substantially conical shape which eliminates secondary reflection resulting from the environmental light reaching the aperture twice. Using the overhang enclosure to absorb the secondary reflection eliminates or minimizes banding.