The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 31, 2017

Filed:

Sep. 21, 2016
Applicant:

Toshiba Memory Corporation, Minato-ku, JP;

Inventors:

Hidenori Miyagawa, Yokkaichi, JP;

Tomoya Kawai, Kawasaki, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 27/115 (2017.01); H01L 21/822 (2006.01); H01L 21/28 (2006.01); H01L 27/11556 (2017.01); H01L 27/11519 (2017.01); H01L 23/532 (2006.01); H01L 23/528 (2006.01);
U.S. Cl.
CPC ...
H01L 27/11556 (2013.01); H01L 23/5283 (2013.01); H01L 23/53209 (2013.01); H01L 27/11519 (2013.01);
Abstract

A semiconductor memory device according to an embodiment comprises: a plurality of control gate electrodes arranged in a first direction intersecting an upper surface of a substrate; a semiconductor layer extending in the first direction and facing a plurality of the control gate electrodes from a second direction intersecting the first direction; and a gate insulating layer provided between the control gate electrode and the semiconductor layer. The semiconductor layer comprises: a first portion extending in the first direction and facing a plurality of the control gate electrodes; and a second portion provided on a closer side to the substrate than this first portion. A film thickness of the first portion in the second direction is larger than a film thickness of the second portion in the second direction. A crystal grain included in the first portion is larger than a crystal grain included in the second portion.


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