The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 31, 2017
Filed:
Aug. 28, 2015
Varian Semiconductor Equipment Associates, Inc., Gloucester, MA (US);
Frank Sinclair, Boston, MA (US);
Jay T. Scheuer, Rowley, MA (US);
William Davis Lee, Newburyport, MA (US);
Peter L. Kellerman, Essex, MA (US);
Varian Semiconductor Equipment Associates, Inc., Gloucester, MA (US);
Abstract
Methods for processing of a workpiece are disclosed. A fluid that contains a desired dopant is prepared. The workpiece is immersed in this fluid, such that the dopant is able to contact all surfaces of the workpiece. The fluid is then evacuated, leaving behind the dopant on the workpiece. The dopant is then subjected to a thermal treatment to drive the dopant into the surfaces of the workpiece. In certain embodiments, a selective doping process may be performed by applying a mask to certain surfaces prior to immersing the workpiece in the fluid. In certain embodiments, the fluid may be in a super-critical state to maximize the contact between the dopant and the workpiece.