The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 31, 2017
Filed:
Nov. 03, 2014
Tokyo Electron Limited, Tokyo, JP;
Daihen Corporation, Osaka-shi, Osaka, JP;
Hiroo Konno, Miyagi, JP;
Shunsuke Kadooka, Osaka, JP;
TOKYO ELECTRON LIMITED, Tokyo, JP;
DAIHEN CORPORATION, Osaka-Shi, Osaka, JP;
Abstract
In a plasma processing apparatus, target values for feedback control to be applied to a progressive wave power PF as control parameters, i.e., control instruction values Cand Care switched during a pulse-on period Tand a pulse-off period Tin each cycle of a modulation pulse, respectively. That is, a first feedback control for making the progressive wave power PF approximate to a first control instruction value Cis performed during the pulse-on period T, whereas a second feedback control for making the progressive wave power PF approximate to a second control instruction value Cis performed during the pulse-off period T.