The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 31, 2017

Filed:

Jul. 16, 2015
Applicant:

Hon Hai Precision Industry Co., Ltd., New Taipei, TW;

Inventors:

Feng-Yuen Dai, New Taipei, TW;

Chau-Jin Hu, New Taipei, TW;

Kun-Chan Wu, New Taipei, TW;

Jia-Ming Wang, New Taipei, TW;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 5/02 (2006.01); G02B 1/10 (2015.01);
U.S. Cl.
CPC ...
G02B 1/10 (2013.01); G02B 5/0221 (2013.01); G02B 5/0242 (2013.01); G02B 5/0284 (2013.01);
Abstract

A compound reflective plate includes a metal base and a reflective film. The metal base includes a reflective surface. The reflective film is covering the reflective surface. The reflective film includes colloidal transparent substrate, reflective particles, and diffusion particles. A surface of the reflective film opposite to the metal base is a rough, irregular, and curved surface. A mass ratio of the diffusion particles to the sum of the colloidal transparent substrate and the reflective particles ranges from 0.05 to 0.07. A mass ratio of the reflective particles to the colloidal transparent substrate ranges from 0.25 to 0.54.


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