The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 31, 2017
Filed:
Nov. 20, 2012
Applicant:
Hitachi High-technologies Corporation, Tokyo, JP;
Inventors:
Yoshinobu Kohara, Tokyo, JP;
Yuzuru Takamura, Ishikawa, JP;
Assignee:
Hitachi High-Technologies Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01J 3/30 (2006.01); G01N 21/67 (2006.01); G01N 21/05 (2006.01);
U.S. Cl.
CPC ...
G01N 21/67 (2013.01); G01N 21/05 (2013.01); G01N 2201/067 (2013.01); G01N 2201/08 (2013.01);
Abstract
To improve the detection sensitivity, detection accuracy, and reproducibility when electrostatic discharge is generated in a sample solution and analysis is performed using light emission in the generated plasma. A flow channel, which has cylindrical main portions each expanding conically from a narrow portion, is filled with a conductive sample solution, and an electric field is applied to the flow channelto generate plasma in the generated air bubbles, so that the resulting light emission is measured.