The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 24, 2017

Filed:

Jul. 13, 2015
Applicant:

Taiwan Semiconductor Manufacturing Company, Ltd., Hsin-Chu, TW;

Inventors:

Jui-Yao Lai, Yuanlin Township, TW;

Chun-Yi Lee, Beipu Township, TW;

Shyh-Wei Wang, Hsin-Chu, TW;

Yen-Ming Chen, Chu-Pei, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 49/02 (2006.01); H01L 29/06 (2006.01); H01L 23/522 (2006.01); H01L 27/06 (2006.01); H01L 29/08 (2006.01); H01L 21/8238 (2006.01); H01L 27/08 (2006.01);
U.S. Cl.
CPC ...
H01L 28/24 (2013.01); H01L 23/5228 (2013.01); H01L 27/0629 (2013.01); H01L 28/20 (2013.01); H01L 29/0649 (2013.01); H01L 29/0847 (2013.01); H01L 21/823842 (2013.01); H01L 27/0802 (2013.01); H01L 2924/0002 (2013.01);
Abstract

A system and method for forming a resistor system is provided. An embodiment comprises a resistor formed in a U-shape. The resistor may comprise multiple layers of conductive materials, with a dielectric layer filling the remainder of the U-shape. The resistor may be integrated with a dual metal gate manufacturing process or may be integrated with multiple types of resistors.


Find Patent Forward Citations

Loading…