The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 24, 2017

Filed:

Sep. 22, 2016
Applicant:

Taiwan Semiconductor Manufacturing Co., Ltd., Hsinchu, TW;

Inventors:

Shun-Jang Liao, Taoyuan, TW;

Shu-Hui Wang, Hsinchu, TW;

Shih-Hsun Chang, Hsinchu, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/8238 (2006.01); H01L 21/3205 (2006.01); H01L 21/4763 (2006.01); H01L 21/8234 (2006.01); H01L 27/088 (2006.01); H01L 29/49 (2006.01); H01L 29/66 (2006.01);
U.S. Cl.
CPC ...
H01L 21/82345 (2013.01); H01L 21/823431 (2013.01); H01L 21/823456 (2013.01); H01L 27/0886 (2013.01); H01L 29/4966 (2013.01); H01L 29/66545 (2013.01);
Abstract

A semiconductor device includes a first semiconductor channel, a second semiconductor channel, a first gate stack and a second gate stack. The first gate stack is present on the first semiconductor channel. The first gate stack includes a first work function layer and a first interposing layer present between the first semiconductor channel and the first work function layer. The second gate stack is present on the second semiconductor channel. The second gate stack includes a second work function layer and a second interposing layer present between the second semiconductor channel and the second work function layer. The first interposing layer and the second interposing layer are different at least in tantalum nitride amount.


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