The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 24, 2017
Filed:
Nov. 14, 2012
Nichias Corporation, Tokyo, JP;
Junya Satoh, Tokyo, JP;
Nobuya Tomosue, Tokyo, JP;
Kazutoshi Isomura, Tokyo, JP;
Kiyoshi Sato, Tokyo, JP;
Tadashi Sakane, Tokyo, JP;
Hiroki Nakamura, Tokyo, JP;
NICHIAS CORPORATION, Tokyo, JP;
Abstract
Provided are a holding material for a gas treatment device, which is inexpensive, has a simple structure, and exhibits high holding force, a gas treatment device, and a method for manufacturing the same. A holding material for a gas treatment device according to the present invention is a holding material, which is a holding material to be arranged, in a gas treatment device including a treatment structure and a casing for housing the treatment structure, between the treatment structure and the casing, the holding material including silica fibers and an alumina sol in an amount of 3 parts by mass or more in terms of a solid content with respect to 100 parts by mass of the silica fibers.