The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 17, 2017

Filed:

May. 31, 2016
Applicants:

Stmicroelectronics, Inc., Coppell, TX (US);

Stmicroelectronics (Crolles 2) Sas, Crolles, FR;

Inventors:

Qing Liu, Irvine, CA (US);

Thomas Skotnicki, Crolles, FR;

Assignees:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/78 (2006.01); H01L 29/66 (2006.01); H01L 29/06 (2006.01); H01L 29/10 (2006.01); H01L 21/28 (2006.01); H01L 29/08 (2006.01); H01L 27/12 (2006.01); H01L 29/423 (2006.01);
U.S. Cl.
CPC ...
H01L 29/7838 (2013.01); H01L 21/28114 (2013.01); H01L 27/1203 (2013.01); H01L 29/0649 (2013.01); H01L 29/0653 (2013.01); H01L 29/0847 (2013.01); H01L 29/1033 (2013.01); H01L 29/42356 (2013.01); H01L 29/66477 (2013.01); H01L 29/66545 (2013.01); H01L 29/66575 (2013.01); H01L 29/66628 (2013.01); H01L 29/66651 (2013.01); H01L 29/7834 (2013.01);
Abstract

An integrated circuit die includes a substrate having a first layer of semiconductor material, a layer of dielectric material on the first layer of semiconductor material, and a second layer of semiconductor material on the layer of dielectric material. An extended channel region of a transistor is positioned in the second layer of semiconductor material, interacting with a top surface, side surfaces, and potentially portions of a bottom surface of the second layer of semiconductor material. A gate dielectric is positioned on a top surface and on the exposed side surface of the second layer of semiconductor material. A gate electrode is positioned on the top surface and the exposed side surface of the second layer of semiconductor material.


Find Patent Forward Citations

Loading…