The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 10, 2017
Filed:
Mar. 18, 2014
Applicant:
Micron Technology, Inc., Boise, ID (US);
Inventors:
Shu Qin, Boise, ID (US);
Allen McTeer, Eagle, ID (US);
Assignee:
Micron Technology, Inc., Boise, ID (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/32 (2006.01); G01N 21/73 (2006.01); C23C 14/54 (2006.01); C23C 16/52 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32917 (2013.01); C23C 14/54 (2013.01); C23C 16/52 (2013.01); G01N 21/73 (2013.01); H01J 37/32935 (2013.01); H01J 37/32972 (2013.01);
Abstract
Systems and methods for plasma processing of microfeature workpieces are disclosed herein. In one embodiment, a method includes generating a plasma in a chamber while a microfeature workpiece is positioned in the chamber, measuring optical emissions from the plasma, and determining a parameter of the plasma based on the measured optical emissions. The parameter can be an ion density or another parameter of the plasma.