The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 10, 2017

Filed:

Mar. 03, 2016
Applicant:

International Business Machines Corporation, Armonk, NY (US);

Inventors:

Leo Gross, Adliswil, CH;

Gerhard Meyer, Wollerau, CH;

Bruno Schuler, Siebnen, CH;

Wolfram Steurer, Adliswil, CH;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01Q 60/30 (2010.01); G01Q 60/32 (2010.01); G01Q 30/06 (2010.01); G01R 19/00 (2006.01);
U.S. Cl.
CPC ...
G01Q 60/30 (2013.01); G01Q 30/06 (2013.01); G01Q 60/32 (2013.01); G01R 19/0084 (2013.01);
Abstract

A method for determining a value of a local contact potential difference by noncontact atomic force microscopy. For one or more cantilever positions above a surface of a sample: i) determining two distinct voltage values of DC voltage applied between an oscillating cantilever and the sample, and ii) determining, by one or more processors, a value of a local contact potential difference based, at least in part, on the two distinct voltage values that were determined.


Find Patent Forward Citations

Gross, Leo. (2017). Determination of local contact potential difference by noncontact atomic force microscopy (U.S. Patent No. 9784762). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9784762

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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