The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 03, 2017
Filed:
Dec. 04, 2014
Applicant:
Ulvac, Inc., Chigasaki-shi, Kanagawa, JP;
Inventor:
Katsuaki Nakano, Chigasaki, JP;
Assignee:
ULVAC, Inc., Chigasaki-shi, JP;
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/44 (2006.01); H01L 21/308 (2006.01); C23C 14/06 (2006.01); C23C 14/58 (2006.01); H01L 21/311 (2006.01); H01L 21/3205 (2006.01); H01L 21/321 (2006.01);
U.S. Cl.
CPC ...
H01L 21/3081 (2013.01); C23C 14/0641 (2013.01); C23C 14/584 (2013.01); C23C 14/5806 (2013.01); C23C 14/5826 (2013.01); H01L 21/31144 (2013.01); H01L 21/321 (2013.01); H01L 21/32051 (2013.01);
Abstract
A method of forming a hard mask includes depositing step for depositing a titanium nitride film on a surface of a to-be-processed object; adsorbing step for adsorbing oxygen-containing molecules onto a surface of the titanium nitride film; and heating step for heating the titanium nitride film to a predetermined temperature.