The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 26, 2017
Filed:
Dec. 06, 2016
Applicant:
Applied Materials, Inc., Santa Clara, CA (US);
Inventors:
Assignee:
APPLIED MATERIALS, INC., Santa Clara, CA (US);
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/02 (2006.01); C23C 14/22 (2006.01); C23C 14/06 (2006.01);
U.S. Cl.
CPC ...
H01L 21/02532 (2013.01); C23C 14/0652 (2013.01); C23C 14/22 (2013.01); H01L 21/02592 (2013.01); H01L 21/02631 (2013.01);
Abstract
Methods and apparatus for reducing particles generated in a process carried out in a process chamber are provided herein. In some embodiments, a process kit shield includes: a body having a surface facing a processing volume of a physical vapor deposition (PVD) process chamber, wherein the body is composed of aluminum oxide (AlO); and a silicon nitride layer on the surface of the body.
Zeng, Weimin. (2017). Particle reduction in a physical vapor deposition chamber (U.S. Patent No. 9773665). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9773665
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile