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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9772554 B1

PDFFull Text
Date of Patent:
Sep. 26, 2017

Filed:

Feb. 25, 2016

Copolymer formulation for directed self-assembly, methods of manufacture thereof and articles comprising the same

Applicants:

Dow Global Technologies Llc, Midland, MI (US);

Rohm and Haas Electronic Materials Llc, Malborough, MA (US);

The Regents of the University of California, Oakland, CA (US);

Inventors:

Phillip D. Hustad, Watertown, MA (US);

Peter Trefonas, III, Medway, MA (US);

Valeriy V. Ginzburg, Midland, MI (US);

Bongkeun Kim, Goleta, CA (US);

Glenn H. Fredrickson, Santa Barbara, CA (US);

Assignees:

DOW GLOBAL TECHNOLOGIES LLC, Midland, MI (US);

ROHM AND HAAS ELECTRONIC MATERIALS LLC, Marlborough, MA (US);

THE REGENTS OF THE UNIVERSITY OF CALIFORNIA, Oakland, CA (US);

Attorney:

Cantor Colburn LLP

Primary Examiner:

Amanda C Walke

Int. Cl.
CPC ...
G03F 7/16 (2006.01); H01L 21/027 (2006.01); C09D 153/00 (2006.01); C09D 5/00 (2006.01); C09D 7/12 (2006.01); G03F 7/20 (2006.01); G03F 7/00 (2006.01); G03F 7/40 (2006.01); H01L 21/3065 (2006.01); H01L 21/02 (2006.01); B82Y 40/00 (2011.01); B82Y 10/00 (2011.01); C08F 293/00 (2006.01); C08F 299/00 (2006.01); C08L 53/00 (2006.01);
U.S. Cl.
CPC ...
G03F 7/165 (2013.01); B82Y 10/00 (2013.01); B82Y 40/00 (2013.01); C08F 293/005 (2013.01); C08F 299/00 (2013.01); C08L 53/00 (2013.01); C09D 5/00 (2013.01); C09D 7/125 (2013.01); C09D 153/00 (2013.01); G03F 7/0002 (2013.01); G03F 7/0035 (2013.01); G03F 7/2022 (2013.01); G03F 7/2059 (2013.01); G03F 7/40 (2013.01); H01L 21/0271 (2013.01); H01L 21/0274 (2013.01); H01L 21/02112 (2013.01); H01L 21/3065 (2013.01); C08F 2438/01 (2013.01);
Abstract

Disclosed herein is a pattern forming method comprising providing a substrate devoid of a layer of a brush polymer; disposing upon the substrate a composition comprising a block copolymer comprising a first polymer and a second polymer; where the first polymer and the second polymer of the block copolymer are different from each other; and an additive polymer where the additive polymer comprises a bottlebrush polymer; where the bottlebrush polymer comprises a polymeric chain backbone and a grafted polymer that are bonded to each other; and where the bottlebrush polymer comprises a polymer that is chemically and structurally the same as one of the polymers in the block copolymer or where the bottlebrush polymer comprises a polymer that has a preferential interaction with one of the blocks of the block copolymers; and a solvent; and annealing the composition to facilitate domain separation between the first polymer and the second polymer.

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